Elevator - Import export

Rack & pinion jack for lifting, lowering, adjusting and fixing of mechanical components, devices, machines etc., load 0,5 t up to 10 t Rack & Pinion Jack, wallmounting 1659 Rack & pinion jack with flange, wallmounting, for pulling and pushing load, capacity 1,5 - 5 t

Optigrun Edge Elements made from stone fibre slabs to enclose elevated greening areas (e.g. elevated planting beds) and separate structure levels of different heights.

High braking torque and small installation space: The compact and powerful BFK464-R dual-circuit spring-applied brake from INTORQ does it economically. This brake works with a split armature plate and two independent coil circuits. It reliably complies with the legal requirements for redundancy, such as for use in passenger elevators. In addition to the reliable braking torque, the high switching dynamics add even more safety. Switching noises are kept to a minimum. This is achieved by the well-engineered damping system. Another plus is the compact design: The rotor neck only minimally protrudes into the motor bearing shield, and the gear teeth of the rotor are particularly short.

The Elevation Line includes both DC spring-pressure single-disc brakes as well as spring-pressure double-disc brakes which comply with EN 81 (Safety Regulations Concerning the Design and Installation of Elevators). Integrated micro-switches allow for remote inquiry of the brake condition (armature position, wear, armature bearing). Owing to the patented safety concept, the otherwise mandatory testing of the dual-circuit braking system of the spring-pressure brake at the approval of the elevator system can be dropped. The brake can be used in places where short construction lengths with respective system components like motor, gear and brake must be realized. The Elevation Line is primarily used for elevators, but can be used wherever the brake must meet demanding safety requirements. Electromagnetic spring-pressure brakes build up the braking torque when the current is switched off.