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Ultraviolet - Import export

Netherlands

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Germany

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Maximize performance with UV reflectors For ultraviolet light reflectivity, manufacturers trust our POREX® Virtek™ sintered PTFE sheets and molded 3-D parts. With over 97% average reflectance from 250nm to 400nm, POREX Virtek™ pure PTFE reflectors can maximize disinfection rates and minimize system cost. Specifically designed for UV systems, our UV reflectors: Eliminate hot and cold spots – POREX® Virtek™ PTFE scatters light in all directions, spreading UV light evenly across a surface and eliminating cold spots where bacteria may survive. Maximize lighting efficacy – With over 97% average reflectance from 220nm to 400nm, less light is lost to absorption. Maintain performance in high temperatures – Working temperature of POREX Virtek™ PTFE is 260ºC.

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Turkey

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Poland

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Ultraviolet (UV) treatment effectively destroys 99.9% of waterborne microorganisms. PRAB’s line of UV systems for water purification are an environmentally friendly alternative to chlorine disinfection and have no disinfection byproducts (DBP’s). UV purification is used with other forms of filtration, such as a reverse osmosis (RO) and ozone systems and is compact in size. PRAB Water & Wastewater is a leader in fluid waste management, ultrafiltration, wastewater reuse, and reverse osmosis pre-treatment with partnerships that span globally. Our UV systems effectively destroy 99.9% of waterborne microorganisms. Effluent water can be discharged to a sewer or reused. Systems offer a robust design which effectively removes organic impurities from a variety of different water streams for optimum fluid waste management.

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United Kingdom

Ultraviolet light sources have many applications in industry, health and hygiene, printing, security and many more. With over 24 years of experience in specialist lighting, Victory can supply high-quality products for OEMs in these industries. Products include high pressure mercury lamps for industrial processing and germicidal lamps. Accessories are also available, such as UV reflectors and LED UV modules.

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Spain

Detector de billetes DBF 3300 Valido para los 8 billetes de Euro Validacion infraroja, magnética, hilo de seguridad y dimensiones Arrastre motorizado del billete con salida frontal y trasera Acepta el billete en sus 4 posiciones Alarma sonora al detectar un billete sospechoso

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Croatia

elight Company, Inc. designs, manufactures, and internationally distributes a wide range of high-quality special replacement mercury, gallium, iron and other metal halide bulbs. Also known as ultraviolet curing, drying, or graphics arts lamps. Medium pressure bulbs are used to cure inks and adhesives quickly and consistently. Ultraviolet curing uses less energy than conventional drying methods, and minimizes VOC emissions. We are supplier of quality direct replacement for series of printing equipment and uv ovens ncluding Gallus, Mark Andy, GEW, IST, Brewer, and more. Applications: Adhesive setting CD & DVD curing Exposure Equipment Graphics Arts Printing Inkjet Systems Label Printing Photochemical Lamps & Wells Portable Curing Equipment Printed Circuit Boards Roller Coaters Screen Printing

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Croatia

The UVO method is a photo-sensitized oxidation process in which the contaminant molecules of photo resists, resins, human skin oils, cleaning solvent residues, silicone oils, and flux are excited and/or dissociated by the absorption of short-wavelength UV radiation. Atomic oxygen is simultaneously generated when molecular oxygen is dissociated by 184.9 nm and ozone by 253.7 nm uv. The 253.7 nm UV radiation is absorbed by most hydrocarbons and also by ozone. The products of this excitation of contaminant molecules react with atomic oxygen to form simpler, volatile molecules which desorbs from the surface. Therefore, when both UV wavelengths are present atomic oxygen is continuously generated, and ozone is continually formed and destroyed. By placing properly pre-cleaned samples within five millimeters of ozone producing UV source, such as the low pressure mercury vapor grid lamp in the UVO-Cleaner ®, near atomically clean surfaces can be achieved in less than one minute.

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