Roots pumps - Import export

Due to the individual speed control, the Roots pumps of the innovative HiLobe® series offer a nominal pumping speed range of 520 - 2,100 m³/h and can be perfectly adjusted to customer-specific requirements. In general, Roots pumps need a backing pump adapted to the gas flow and which is suitable for the application in order to operate.

Mid-frequency magnetron sputtering technology has gradually become the mainstream of sputtering coating technology. Coating: Multi-function metal coating, composite membrane, transparent conductive coating, Increase return to shoot coating, electromagnetic shielding coating, decorative coating, etc. Power supply: DC magnetron sputtering power supply, MF sputtering power supply, high pressure ion bombard power supply. Target: DC magnetron sputtering target, MF twin targets, planner target, cylinder target. Vacuum chamber structure: Vertical signal door, Vertical double doors. Pump system: Molecule pump (diffusion pump)+Roots pump+ Holding pump(optional: turbo pump, poly cold system) Air system: Mass flow controller (1-4road) Ultimate vacuum: 6x10-4pa (no-loading, clean chamber) Pumping time: No-loading from air to 5x10-3pa＜13mins Workplace motion mode: 6 axis/8axis/9axis public and self-rotation

The HiCube Neo redefines performance with an impressive pumping speed of 80 - 800 l/s, ideal for demanding high vacuum applications. The HiPace 300 H even enables ultra-high vacuum up to 10-10 hPa. The availability of various backing pumps, such as diaphragm, rotary vane, scroll and multi-stage Roots pumps, makes it extremely versatile. Whether as a compact desktop solution or as a stand-alone unit, the HiCube Neo adapts to any requirement.