Liquid crystals - Import export

Application semiconductor material, Magnetic substance Shape soild Material gallium Chemical Composition Ga, Ga,Ga-In-Sn, Ga-In-Zn Purity 99.9% Min MOQ 2.5kg Package 2.5kg/bottle

Application semiconductor material, Magnetic substance Shape soild Material gallium Chemical Composition Ga, Ga,Ga-In-Sn, Ga-In-Zn Purity 99.9% Min MOQ 2.5kg Package 2.5kg/bottle

CLube Linear Roller Way Super MX incorporates CLube lubrication into the Linear Roller Way Super X. The same high performance can be achieved for applications requiring high load capacity and running accuracy such as machine tools and semiconductor/liquid crystal related manufacturing equipment, but with CLube, longterm, maintenancefree performance can also be realized. This reduces the cost of the whole system by reducing the running costs and the work hours required for lubrication.

CLube Linear Ball Spline MAG incorporates CLube in the IKO Ball Spline G. MAG is used primarily in semiconductor/liquid crystal related manufacturing equipment where harsh operating conditions and high acceleration/deceleration are common. CLube provides longterm, maintenance free operation, and reduces the cost of the whole system by eliminating the oil supply mechanism and reducing the running cost and hours required for lubrication.

Using IKO CLube Linear Way L for the linear motion rolling guide and IKO Crossed Roller Bearings in the rotation guiding parts, while adopting direct drive method in the drive section, IKO Alignment Stage SA···DE is a compact, lowprofile alignment stage which achieves XYθ motion.Alignment Stage SA···DE achieves highly accurate positioning without backlash by combining a highresolution linear scale and full closed loop control. An ideal positioning mechanism for alignment processing using image processing, such as in semiconductor/liquid crystal manufacturing equipment, or for measuring instruments or testing and inspection equipment requiring clean environments.

Glycoluril is a white powder, its chemical formula is C4H6N4O2. It is a bisurea compound which is mainly used in the production of glycoluril resins for paints and coatings. Further it has been used for water treatment as swimming pool disinfectants, slimicide enhancer in pulp/paper processing and as slow release nitrogen fertilizer. In the materials sector it can be used in tailor made polymers, liquid crystals and synthetic receptors. Glycoluril is also known as acetylene carbamide, acetylenediurea, acetyleneurea and glyoxaldiureine and perhydroimidazo[4,5d]imidazole2,5dione. Availability Europe and United States Provided Glycoluril is on stock in our local warehouses our lead time is about one week if delivered in 25 KG paper bags. Canada, South America, South Africa and other markets can also be served, please contact our sales department for more details.

Features Flat spray pneumatic nozzle producing semi-fine (and semi-coarse) atomization having a mean droplet diameter of 50μm or more. (*3) High spray impact with thin flat spray pattern and uniform distribution. Liquid pressure type under the liquid pressures of 0.2–0.5 MPa (ca. 2 bar – 5 bar). Large turn-down ratio with stable spray angle. Spray angle of 60° or 80° *1) Measured at compressed air pressure of 0.4 MPa (ca. 4 bar) and liquid pressure of 0.5 MPa (ca. 5 bar). *2) Free passage diameter of nozzle orifice. *3) Measured by Laser Doppler Method. Applications Cleaning: Printed circuit boards, liquid crystal, liquid crystal display, steel plates [Steel making industry] Surface finish process: Precision cleaning for steel surface treatment, Roll cleaning

Features Pneumatic slit-laminar nozzle with uniform spray distribution throughout the entire spray pattern area. While multiple-nozzle alignment of conventional pneumatic spray nozzles leaves some spots unwashed, PSN nozzles provide uniform spray distribution and achieve a complete cleaning, leaving no spot unwashed. PSN can be used at a short distance. *1) Measured at compressed air pressure of 0.1–0.4 MPa (ca . 1 bar – 4 bar) and liquid pressure of 0.1–0.4 MPa (ca . 1 bar – 4 bar) for PSN nozzle with slit length of 1000 mm and slit opening of 0.05 mm. Applications Cleaning: Glass substrate, liquid crystal Cooling: Steel plates, moldings Moisture control: Paper, cardboard [Steel making industry] Surface finish process: Precision cleaning for steel surface treatment, Roll cleaning