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Silicon sputtering target - Import export

China
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China

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Titanium sputtering targets integrated circuit information storage laser use Metal Fabrication Part

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China

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Chemical Composition: AZO Molding process: CIP+Sintering+Bonding Purity: ≥5.4g/cm3 Density: ≥ 99.95% Application: Widely used in Thin film solar cell electrode film, Low-e glass film Maximum Machining Size L 4000MM T 5MM Straight & Dogbone Customize to Customers' Specification

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Silicon sputtering target - Import export

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