Plasma-Surface-Treatment-System | Nano - Low-pressure Plasma system, Plasma-Surface-Treatment-System, Plasma Cleaner

Plasma systems from Diener electronic have long since established themselves in a wide range of industrial sectors. With the Nano low-pressure plasma system, you can rely on modern and future-proof cold plasma technology in a vacuum. The chamber volume of 18 up to 24 litres of this plasma system offers enough space to serve laboratory and also series production. Plasma treatment in low-pressure plasma is a proven technique for controlled ultra-fine cleaning, improvement of adhesion (activation and etching) and coating of thin layers on substrate surfaces. Plasma is generated by applying high-frequency voltage in the vacuum chamber. In the process, the process gas introduced there is ionised. Fields of application: VOC-free cleaning of organic residues. Activation before painting, gluing, potting, ... Etching of PTFE, photoresist, oxide layers, ... Super-hydrophobic and -hydrophilic coatings Dimensions (Table Top):560 mm x 600 - 860 mm x 600 mm (WxHxD) Dimensions (Stand Alone):600 mm x 1700 mm x 800 mm (WxHxD) Vacuum Chamber material:Stainless steel, Aluminium, Silica glass (UHP), Borosilicate (HP) Vacuum Chamber dimensions:ca. W 240 mm x H 240 mm x D 400 - 420 mm; Ø 267 mm, D 400 - 420 mm Vacuum Chamber volume:approx. 18 - 24 litres Vacuum Chamber closure:Lid, hinged door Gas supply:Needle valves or mass flow controllers (MFCs) Pressure measurement:Pirani, Capacity pressure gauge Generator:100 kHz; 80 kHz; 13,56 MHz; 2,45 GHz Electrodes:According to customer requirements Controles:Semiautomatic, Rotary switch, Basic PC (Win.CE), Full PC (Win.10 IoT) Power supply:230 V / 400 V / 50 - 60 Hz Vacuum pump:Capacity: 16 m³/h